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Welcome to world of software for electron beam lithography and nanotechnology.

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Proxy for Windows is the Electron Beam Lithography system, which is working properly in many countries of the world.
Proxy for Windows is applied on scanning devices of a various type ( scanning electron microscopes ( JEOL, ZEIS ), industrial electronic lithographs ( ZRM12, ZRM20 ), tunnel microscopes and ion-beam lithographs ), successfully deciding a problem of preparation of data, correction of effect of proximity, simulation of resist development, exposure control and other problems arising in the lithography.
Proxy for Windows grants a wide set of functions and tools to achieve qualitative results. It has convenient and intuitionaly clear interface, as well as advanced Help system. Using them it is possible quickly and qualitatively to prepare data, to check up their correctness and to execute simulation and exposure.

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